HIGH SPATIAL RESOLUTION ELECTRON BEAM INDUCED CURRENT
نویسندگان
چکیده
منابع مشابه
Spatial resolution limits in electron-beam-induced deposition
Electron-beam-induced deposition EBID is a versatile microand nanofabrication technique based on electron-induced dissociation of metal-carrying gas molecules adsorbed on a target. EBID has the advantage of direct deposition of three-dimensional structures on almost any target geometry. This technique has occasionally been used in focused electron-beam instruments, such as scanning electron mic...
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ژورنال
عنوان ژورنال: Le Journal de Physique Colloques
سال: 1989
ISSN: 0449-1947
DOI: 10.1051/jphyscol:1989613